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Hasan Uppal
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A real-time evaluation of energy management systems for smart hybrid home Microgrids
M Marzband, SS Ghazimirsaeid, H Uppal, T Fernando
Electric Power Systems Research 143, 624-633, 2017
1822017
Optimal energy management system based on stochastic approach for a home Microgrid with integrated responsive load demand and energy storage
M Marzband, H Alavi, SS Ghazimirsaeid, H Uppal, T Fernando
Sustainable cities and society 28, 256-264, 2017
1642017
Dielectric breakdown in chemical vapor deposited hexagonal boron nitride
L Jiang, Y Shi, F Hui, K Tang, Q Wu, C Pan, X Jing, H Uppal, F Palumbo, ...
ACS applied materials & interfaces 9 (45), 39758-39770, 2017
522017
Breakdown and degradation of ultrathin Hf-based (HfO2) x (SiO2) 1− x gate oxide films
HJ Uppal, IZ Mitrovic, S Hall, B Hamilton, V Markevich, AR Peaker
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2009
262009
Reliability nano-characterization of thin SiO2 and HfSixOy/SiO2 gate stacks
E Efthymiou, S Bernardini, SN Volkos, B Hamilton, JF Zhang, HJ Uppal, ...
Microelectronic engineering 84 (9-10), 2290-2293, 2007
182007
Smart integrated adaptive centralized controller for islanded microgrids under minimized load shedding
M Karimi, R Azizipanah-Abarghooee, H Uppal, Q Hong, C Booth, ...
2017 5th International Istanbul Smart Grid and Cities Congress and Fair …, 2017
162017
Dynamic behavior of multi-carrier energy market in view of investment incentives
J Valinejad, M Marzband, Y Xu, H Uppal, A Saad Al-Sumaiti, T Barforoshi
Electrical Engineering 101, 1033-1051, 2019
112019
An investigation on using electrical resistance tomography (ERT) to monitor the removal of a non-Newtonian soil by water from a cleaning-in-place (CIP) circuit containing …
R Hou, PJ Martin, HJ Uppal, AJ Kowalski
Chemical Engineering Research and Design 111, 332-341, 2016
102016
A power hardware-in-the-loop simulation facility for testing grid-connected storage systems
R Todd, HJ Uppal, T Feehally, AJ Forsyth, AM Pavan
2019 IEEE Power & Energy Society Innovative Smart Grid Technologies …, 2019
72019
Nanoscale electrical characterization of ultrathin high-k dielectric MOS stacks: A conducting AFM study
HJ Uppal, S Bernardini, E Efthymiou, SN Volkos, A Dimoulas, ...
Materials science in semiconductor processing 11 (5-6), 250-253, 2008
42008
Post-stress/breakdown leakage mechanism in ultrathin high-κ (HfO2) x (SiO2) 1-x/SiO2 gate stacks: A nanoscale conductive-Atomic Force Microscopy C-AFM
HJ Uppal, V Markevich, SN Volkos, A Dimoulas, B Hamilton, AR Peaker
MRS Online Proceedings Library (OPL) 1108, 1108-A10-06, 2008
12008
Nanoscale localized current transport mechanism in ultrathin ALD high-κ HfO2/SiOx-CL/Ge gate stacks: conductive-Atomic Force Microscopy C-AFM
HJU H. Grampeix, C. Le Loyer, M. Houssa, V. Markevich, A. Dimoulas, S. N ...
to be submitted for Journal of Applied Physics, 2016
2016
Electrical Reliability Characterization under Nanoscale Degradation and Breakdown in Ultrathin HfO2/SiO2 and ZrO2/GeO2 high-κ integrated MOS gate stacks: by Conductive-Atomic …
HJU E. Whittaker, V. Markevich, A. Dimoulas, S. N. Volkos, B. Hamilton, A. R ...
to be submitted for Journal of Applied Physics, 2016
2016
Transients of Pre-Stress Ramp Voltage Stress RVS and Post-stress Constant Voltage Stress CVS Imaging on the Electrical Degradation of Ultrathin HfSixOy/SiO2 MOS stacks: a …
HJU E. Whittaker, V. Markevich, A. R. Peaker, B. Hamilton
to be submitted for Journal of Applied Physics, 2016
2016
Post-stress/breakdown leakage mechanism in ultrathin high-?(HfO2) x (SiO2) 1-x/SiO2 gate stacks: a nanoscale conductive-atomic force microscopy C-AFM
HJ Uppal, SN Volkos, A Dimoulas, B Hamilton, AR Peaker
Materials Research Society, 2009
2009
Nanoscale Performance, Degradation and Defect Analysis of MOS Devices Using High-κ Dielectric Materials as Gate Stacks by Atomic Force Microscopy.
HJ Uppal
PQDT-Global, 2009
2009
Nanoscale performance, degradation and defect analysis of mos devices using high-k dielectric materials as gate stacks by atomic force microscopy
HJ Uppal
The University of Manchester, 2009
2009
Non–homogeneous lateral propagation of leakage and degradation: a phenomenology in ultrathin multilayered high-κ [(HfO 2) x (SiO x)/SiO x] gate stacks Non–homogeneous lateral …
HJ Uppal, V Markevich, E Wittacker, AR Peaker, B Hamilton, SN Volkos, ...
Interface control, inhomogeneity and instability analysis of ultrathin High–κ/GeO x/Ge and High-κ/SiO x-CL/Ge gate stacks: under Conductive Atomic Force Microscopy
HJ Uppal, E Whittaker, V Markevich, AR Peaker, B Hamilton, SN Volkos, ...
ve flEHIRLER KONGRE ve FUARI BILIMSEL PROGRAMI
S Data, B FEiziFAR, O USTA, L Shedding, M KARiMi, ...
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