Stefan Partel
Stefan Partel
Research Scientist, Vorarlberg University of Applied Sciences
Verified email at fhv.at
Title
Cited by
Cited by
Year
Cryogenic surface ion trap based on intrinsic silicon
M Niedermayr, K Lakhmanskiy, M Kumph, S Partel, J Edlinger, ...
New Journal of Physics 16 (11), 113068, 2014
502014
Growth and alignment of thin film organic single crystals from dewetting patterns
JN Tisserant, G Wicht, OF Göbel, E Bocek, GL Bona, T Geiger, R Hany, ...
ACS nano 7 (6), 5506-5513, 2013
232013
Lift-off free fabrication approach for periodic structures with tunable nano gaps for interdigitated electrode arrays
S Partel, C Dincer, S Kasemann, J Kieninger, J Edlinger, G Urban
ACS nano 10 (1), 1086-1092, 2016
212016
Contact and proximity lithography using 193 nm Excimer laser in Mask Aligner
S Partel, S Zoppel, P Hudek, A Bich, U Vogler, M Hornung, R Voelkel
Microelectronic engineering 87 (5-8), 936-939, 2010
202010
A simple fabrication process for disposable interdigitated electrode arrays with nanogaps for lab-on-a-chip applications
S Partel, S Kasemann, V Matylitskaya, C Thanner, C Dincer, G Urban
Microelectronic Engineering 173, 27-32, 2017
162017
Novel fabrication process for sub-micron interdigitated electrode arrays for highly sensitive electrochemical detection
S Partel, S Kasemann, P Choleva, C Dincer, J Kieninger, GA Urban
Sensors and Actuators B: Chemical 205, 193-198, 2014
152014
Optimization of illumination pupils and mask structures for proximity printing
K Motzek, A Bich, A Erdmann, M Hornung, M Hennemeyer, B Meliorisz, ...
Microelectronic Engineering 87 (5-8), 1164-1167, 2010
152010
Mask aligner lithography simulation–From lithography simulation to process validation
K Motzek, S Partel, A Bramati, U Hofmann, N Ünal, M Hennemeyer, ...
Microelectronic engineering 98, 121-124, 2012
142012
Investigation of high-resolution contact printing
B Meliorisz, S Partel, T Schnattinger, T Fühner, A Erdmann, P Hudek
Microelectronic Engineering 85 (5-6), 744-748, 2008
142008
Fabrication process development for a high sensitive electrochemical IDA sensor
S Partel, M Mayer, P Hudek, C Dinçer, J Kieninger, GA Urban, K Motzek, ...
Microelectronic engineering 97, 235-240, 2012
132012
CRISPR-powered electrochemical microfluidic multiplexed biosensor for target amplification-free miRNA diagnostics
R Bruch, M Johnston, A Kling, T Mattmüller, J Baaske, S Partel, ...
Biosensors and Bioelectronics 177, 112887, 2021
112021
Enhanced Protein Immobilization on Polymers—A Plasma Surface Activation Study
F Wieland, R Bruch, M Bergmann, S Partel, GA Urban, C Dincer
Polymers 12 (1), 104, 2020
102020
Design and simulation of 20-channel 50-GHz Si3N4-based arrayed waveguide grating applying AWG-parameters tool
D Seyringer, C Burtscher, S Partel, J Edlinger, A Maese-Novo, P Muellner, ...
Integrated Optics: Devices, Materials, and Technologies XXI 10106, 101061L, 2017
102017
Design and simulation of Si3N4 based arrayed waveguide gratings applying AWG-Parameters tool
D Seyringer, C Burtscher, S Partel, J Edlinger, A Maese-Novo, P Muellner, ...
2016 18th International Conference on Transparent Optical Networks (ICTON), 1-5, 2016
92016
Characterization of low loss microstrip resonators as a building block for circuit QED in a 3D waveguide
D Zoepfl, PR Muppalla, CMF Schneider, S Kasemann, S Partel, ...
AIP Advances 7 (8), 085118, 2017
82017
Electrochemical characterization of nanogap interdigitated electrode arrays for lab-on-a-chip applications
V Matylitskaya, S Kasemann, G Urban, C Dincer, S Partel
Journal of the Electrochemical Society 165 (3), B127, 2018
72018
Impedimetric characterization of interdigitated electrode arrays for biosensor applications
E Kostal, S Kasemann, C Dincer, S Partel
Multidisciplinary Digital Publishing Institute Proceedings 2 (13), 899, 2018
72018
Dewetting-driven hierarchical self-assembly of small semiconducting molecules
JN Tisserant, R Hany, S Partel, GL Bona, R Mezzenga, J Heier
Soft Matter 8 (21), 5804-5810, 2012
72012
Simulation model validation of two common i-line photoresists
S Partel, GA Urban, K Motzek
Microelectronic engineering 110, 75-79, 2013
62013
In-situ measurement and characterization of photoresists during development
S Partel, M Mayer, K Motzek
SPIE Newsroom, 2012
42012
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Articles 1–20