| Methods of manufacturing semiconductor devices MK Song, HJ Lim, M Park, JH Do US Patent 8,877,579, 2014 | 98* | 2014 |
| Methods for fabricating semiconductor devices HSC Dong Hyuk KIM, DongSuk Shin, Myungsun Kim US Patent 8,551,846, 2013 | 49* | 2013 |
| Semiconductor devices with layers commonly contacting fins and methods of manufacturing the same JB Kim, MG Kang, KH Moon, LEE Cho-Eun, J Su-Jin, MH Choi, Y Xu, ... US Patent 10,297,601, 2019 | 47 | 2019 |
| TiO2∕ Al2O3∕ TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition W Jeon, HS Chung, D Joo, SW Kang Electrochemical and Solid-State Letters 11 (2), H19, 2007 | 47 | 2007 |
| Transistors and methods of manufacturing the same H Chung, DS Shin, D Kim, M Kim US Patent 8,637,373, 2014 | 41 | 2014 |
| Semiconductor devices and methods of fabricating the same DH Kim, HS Chung, M Kim, DS Shin US Patent 8,921,192, 2014 | 40 | 2014 |
| Methods of forming semiconductor devices including a stressor in a recess DS Shin, CW Lee, H Chung, YT Kim, N Lee US Patent 9,214,530, 2015 | 34* | 2015 |
| Semiconductor devices including a stressor in a recess and methods of forming the same Dong-Suk Shin, Hyun-Chul Kang, Dong-hyun Roh, Pan-Kwi Park, Geo-Myung SHIN ... US Patent 9,257,520, 2016 | 33* | 2016 |
| Plasma-enhanced atomic layer deposition of TaN thin films using tantalum-pentafluoride and N2∕ H2∕ Ar plasma HS Chung, JD Kwon, SW Kang Journal of The Electrochemical Society 153 (11), C751, 2006 | 29 | 2006 |
| Semiconductor device having embedded strain-inducing pattern and method of forming the same DS Shin, M Kim, SJ Nam, PK Park, H Chung, N Lee US Patent 8,907,426, 2014 | 28 | 2014 |
| Semiconductor devices and methods of fabricating the same DH Kim, DS Shin, M Kim, HS Chung US Patent 9,640,658, 2017 | 24 | 2017 |
| Semiconductor device including transistors having embedded source/drain regions each including upper and lower main layers comprising germanium H Chung, D Kim, M Kim, DS Shin US Patent 8,648,424, 2014 | 24 | 2014 |
| Method of forming a semiconductor device having an epitaxial source/drain HS Rhee, MS Kim, H Lee, HS Chung US Patent App. 12/640,944, 2010 | 21 | 2010 |
| Methods of forming semiconductor devices having faceted semiconductor patterns M Kim, DS Shin, D Kim, YJ Lee, H Chung US Patent 8,703,592, 2014 | 17 | 2014 |
| Semiconductor devices including multilayer source/drain stressors and methods of manufacturing the same NIL Dong Hyuk KIM, Hoi Sung Chung, DongSuk Shin US Patent 20,140,087,537, 2014 | 15* | 2014 |
| Semiconductor device including transistor and method of manufacturing the same NIL Dong Hyuk KIM, DongSuk Shin, Hoi Sung Chung US Patent 8,937,343, 2015 | 11* | 2015 |
| Semiconductor devices having field effect transistors with epitaxial patterns in recessed regions DS Shin, DH Kim, M Kim, YJ Lee, HS Chung US Patent 8,426,926, 2013 | 10 | 2013 |
| Methods of fabricating a semiconductor device H Lee, M Park, HS Rhee, M Kim, H Chung US Patent App. 12/656,842, 2010 | 10 | 2010 |
| Semiconductor devices including an epitaxial layer with a slanted surface DH Kim, DS Shin, M Kim, HS Chung US Patent 9,136,176, 2015 | 6 | 2015 |
| Semiconductor devices with layers commonly contacting fins and methods of manufacturing the same JB Kim, MG Kang, KH Moon, LEE Cho-Eun, J Su-Jin, MH Choi, Y Xu, ... US Patent 11,469,237, 2022 | 4 | 2022 |
