Regina Soufli
Regina Soufli
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The Atmospheric Imaging Assembly (AIA) on the Solar Dynamics Observatory (SDO)
JR Lemen, DJ Akin, PF Boerner, C Chou, JF Drake, DW Duncan, ...
The solar dynamics observatory, 17-40, 2011
Initial Calibration of the Atmospheric Imaging Assembly (AIA) on the Solar Dynamics Observatory (SDO)
P Boerner, C Edwards, J Lemen, A Rausch, C Schrijver, R Shine, L Shing, ...
The Solar Dynamics Observatory, 41-66, 2011
Probing eV-scale axions with CAST
E Arik, S Aune, D Autiero, K Barth, A Belov, B Beltrán, S Borghi, G Bourlis, ...
Journal of Cosmology and Astroparticle Physics 2009 (02), 008, 2009
Coherence properties of individual femtosecond pulses of an x-ray free-electron laser
IA Vartanyants, A Singer, AP Mancuso, OM Yefanov, A Sakdinawat, Y Liu, ...
Physical review letters 107 (14), 144801, 2011
Molybdenum/beryllium multilayer mirrors for normal incidence in the extreme ultraviolet
KM Skulina, CS Alford, RM Bionta, DM Makowiecki, EM Gullikson, ...
Applied Optics 34 (19), 3727-3730, 1995
The soft x-ray instrument for materials studies at the linac coherent light source x-ray free-electron laser
WF Schlotter, JJ Turner, M Rowen, P Heimann, M Holmes, O Krupin, ...
Review of Scientific Instruments 83 (4), 043107, 2012
Reflectance measurements on clean surfaces for the determination of optical constants of silicon in the extreme ultraviolet–soft-x-ray region
R Soufli, EM Gullikson
Applied Optics 36 (22), 5499-5507, 1997
Pulse-dilation enhanced gated optical imager with 5 ps resolution
TJ Hilsabeck, JD Hares, JD Kilkenny, PM Bell, AKL Dymoke-Bradshaw, ...
Review of Scientific Instruments 81 (10), 10E317, 2010
Linac Coherent Light Source soft x-ray materials science instrument optical design and monochromator commissioning
P Heimann, O Krupin, WF Schlotter, J Turner, J Krzywinski, F Sorgenfrei, ...
Review of Scientific Instruments 82 (9), 093104, 2011
Predicting the coherent X-ray wavefront focal properties at the Linac Coherent Light Source (LCLS) X-ray free electron laser
A Barty, R Soufli, T McCarville, SL Baker, MJ Pivovaroff, P Stefan, ...
Optics express 17 (18), 15508-15519, 2009
Optical constants of magnetron-sputtered boron carbide thin films from photoabsorption data in the range 30 to 770 eV
R Soufli, AL Aquila, F Salmassi, M Fernández-Perea, EM Gullikson
Applied optics 47 (25), 4633-4639, 2008
Temporal cross-correlation of x-ray free electron and optical lasers using soft x-ray pulse induced transient reflectivity
O Krupin, M Trigo, WF Schlotter, M Beye, F Sorgenfrei, JJ Turner, DA Reis, ...
Optics Express 20 (10), 11396-11406, 2012
System integration and performance of the EUV engineering test stand
DA Tichenor, AK Ray-Chaudhuri, WC Replogle, RH Stulen, GD Kubiak, ...
Emerging Lithographic Technologies V 4343, 19-37, 2001
Absolute photoabsorption measurements of molybdenum in the range 60–930 eV for optical constant determination
R Soufli, EM Gullikson
Applied Optics 37 (10), 1713-1719, 1998
Photon beamlines and diagnostics at LCLS
S Moeller, J Arthur, A Brachmann, R Coffee, FJ Decker, Y Ding, D Dowell, ...
Nuclear Instruments and Methods in Physics Research Section A: Accelerators …, 2011
Absolute pulse energy measurements of soft x-rays at the Linac Coherent Light Source
K Tiedtke, AA Sorokin, U Jastrow, P Juranić, S Kreis, N Gerken, M Richter, ...
Optics express 22 (18), 21214-21226, 2014
Development and testing of EUV multilayer coatings for the atmospheric imaging assembly instrument aboard the Solar Dynamics Observatory
R Soufli, DL Windt, JC Robinson, SL Baker, E Spiller, FJ Dollar, AL Aquila, ...
Solar Physics and Space Weather Instrumentation 5901, 173-183, 2005
Sub-70 nm extreme ultraviolet lithography at the advanced light source static microfield exposure station using the engineering test stand set-2 optic
P Naulleau, KA Goldberg, EH Anderson, D Attwood, P Batson, J Bokor, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002
Multilayer optics for an extreme-ultraviolet lithography tool with 70-nm resolution
R Soufli, EA Spiller, MA Schmidt, C Davidson, RF Grabner, EM Gullikson, ...
Emerging Lithographic Technologies V 4343, 51-59, 2001
Sub-diffraction-limited multilayer coatings for the 0.3 numerical aperture micro-exposure tool for extreme ultraviolet lithography
R Soufli, RM Hudyma, E Spiller, EM Gullikson, MA Schmidt, JC Robinson, ...
Applied optics 46 (18), 3736-3746, 2007
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