Peter Trefonas
Peter Trefonas
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Cited by
Cited by
Organosilane high polymers: electronic spectra and photodegradation
P Trefonas III, R West, RD Miller, D Hofer
Journal of Polymer Science: Polymer Letters Edition 21 (10), 823-829, 1983
Organosilane high polymers: thermochromic behavior in solution
P Trefonas III, JR Damewood Jr, R West, RD Miller
Organometallics 4 (7), 1318-1319, 1985
Shot noise, LER, and quantum efficiency of EUV photoresists
RL Brainard, P Trefonas, JH Lammers, CA Cutler, JF Mackevich, ...
Emerging Lithographic Technologies VIII 5374, 74-85, 2004
Polysilane high polymers: mechanism of photodegradation
P Trefonas, R West, RD Miller
Journal of the American Chemical Society 107 (9), 2737-2742, 1985
Organosilane high polymers: Synthesis of formable homopolymers
P Trefonas III, PI Djurovich, XH Zhang, R West, RD Miller, D Hofer
Journal of Polymer Science: Polymer Letters Edition 21 (10), 819-822, 1983
Double-heterojunction nanorod light-responsive LEDs for display applications
N Oh, BH Kim, SY Cho, S Nam, SP Rogers, Y Jiang, JC Flanagan, Y Zhai, ...
Science 355 (6325), 616-619, 2017
The optical and electrical properties of silver nanowire mesh films
G Khanarian, J Joo, XQ Liu, P Eastman, D Werner, K O'Connell, ...
Journal of Applied Physics 114 (2), 024302, 2013
Organogermane homopolymers and copolymers with organosilane
P Trefonas, R West
Journal of Polymer Science: Polymer Chemistry Edition 23 (8), 2099-2107, 1985
Nanoscopic cylindrical dual concentric and lengthwise block brush terpolymers as covalent preassembled high-resolution and high-sensitivity negative-tone photoresist materials
G Sun, S Cho, C Clark, SV Verkhoturov, MJ Eller, A Li, A Pavía-Jiménez, ...
Journal of the American Chemical Society 135 (11), 4203-4206, 2013
New principle for image enhancement in single layer positive photoresists
P Trefonas III, BK Daniels
Advances in Resist Technology and Processing IV 771, 194-210, 1987
Resist effects at small pitches
D Van Steenwinckel, JH Lammers, T Koehler, RL Brainard, P Trefonas
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2006
Ill; West, R.; Fickes, G. N
PM Cotts, RD Miller, PT Trefonas
Macromolecules 20 (1046), 0022-3654, 1987
Double-heterojunction nanorods
MS Nuri Oh, Sooji Nam, You Zhai, Kishori Deshpande, Pete Trefonas
Nature Communications 5, 3642, 2014
Methods utilizing antireflective coating compositions with exposure under 200 nm
TG Adams, EK Pavelchek, RF Sinta, M DoCanto, RF Blacksmith, ...
US Patent 6,410,209, 2002
Multilayer transfer printing for pixelated, multicolor quantum dot light-emitting diodes
BH Kim, S Nam, N Oh, SY Cho, KJ Yu, CH Lee, J Zhang, K Deshpande, ...
ACS nano 10 (5), 4920-4925, 2016
Positive/negative mid UV resists with high thermal stability
H Ito, CG Wilson, JMJ Frechet
Advances in Resist Technology and Processing IV 771, 24-31, 1987
Soluble polysilanes: an interesting new class of radiation sensitive materials
RD Miller, D Hofer, GN Fickes, CG Willson, E Marinero, P Trefonas III, ...
Polymer Engineering & Science 26 (16), 1129-1134, 1986
Simple method for measuring acid generation quantum efficiency at 193 nm
CR Szmanda, RJ Kavanagh, JF Bohland, JF Cameron, P Trefonas III, ...
Advances in Resist Technology and Processing XVI 3678, 857-866, 1999
Antireflective coating compositions
P Trefonas III, M DoCanto, EK Pavelchek
US Patent 7,026,101, 2006
Coating compositions for use with an overcoated photoresist
GB Wayton, P Trefonas III, S Coley, T Kurihara
US Patent 6,852,421, 2005
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