| Substrates coated with an antihalation layer that contains a resin binder comprising anthracene units JW Thackeray, GW Orsula US Patent 5,851,730, 1998 | 54 | 1998 |
| Method comprising substrates coated with an antihalation layer that contains a resin binder comprising anthracene units JW Thackeray, GW Orsula US Patent 5,851,738, 1998 | 52 | 1998 |
| Copolymers and photoresist compositions comprising copolymer resin binder component GG Barclay, MF Cronin, RA DellaGuardia, JW Thackeray, H Ito, G Breyta US Patent 6,042,997, 2000 | 51 | 2000 |
| Copolymers and photoresist compositions comprising copolymer resin binder component GG Barclay, MF Cronin, RA DellaGuardia, JW Thackeray, H Ito, G Breyta US Patent 5,861,231, 1999 | 49 | 1999 |
| Dissolution inhibition mechanism of ANR photoresists: crosslinking vs.-OH site consumption JW Thackeray, GW Orsula, MM Rajaratnam, RF Sinta, DJC Herr, ... Advances in Resist Technology and Processing VIII 1466, 39-52, 1991 | 48 | 1991 |
| Polymerizable photoacid generators JW Thackeray, SM Coley, V Jain, O Ongayi, JF Cameron, PJ LaBeaume, ... US Patent 8,900,792, 2014 | 45 | 2014 |
| Characterization and modeling of a positive-acting chemically amplified resist JS Petersen, CA Mack, JW Thackeray, RF Sinta, TH Fedynyshyn, JM Mori, ... Advances in Resist Technology and Processing XII 2438, 153-166, 1995 | 43 | 1995 |
| Coating compositions for use with an overcoated photoresist VR Vohra, JW Thackeray, GB Wayton US Patent 7,919,222, 2011 | 42 | 2011 |
| Radiation sensitive compositions comprising polymer having acid labile groups R Sinta, RC Hemond, DR Medeiros, MM Rajaratnam, JW Thackeray, ... US Patent 5,258,257, 1993 | 41 | 1993 |
| Chemically amplified resists resolving 25 nm 1: 1 line: space features with EUV lithography JW Thackeray, RA Nassar, R Brainard, D Goldfarb, T Wallow, Y Wei, ... Emerging Lithographic Technologies XI 6517, 394-404, 2007 | 40 | 2007 |
| Self-assembled structures, method of manufacture thereof and articles comprising the same S Cho, G Sun, KL Wooley, JW Thackeray, P Trefonas III US Patent 9,223,214, 2015 | 38 | 2015 |
| Optimization of Polymer-bound PAG (PBP) for 20nm EUV Lithography JW Thackeray, VJ Jain, S Coley, M Christianson, D Arriola, P LaBeaume, ... Journal of Photopolymer Science and Technology 24 (2), 179-183, 2011 | 38 | 2011 |
| Antihalation compositions JW Thackeray, GW Orsula US Patent 6,165,697, 2000 | 37 | 2000 |
| Photoresist compositions and methods and articles of manufacture comprising same JF Cameron, MM Rajaratnam, RF Sinta, JW Thackeray US Patent 6,048,672, 2000 | 37 | 2000 |
| Backbone degradable poly (aryl acetal) photoresist polymers: synthesis, acid sensitivity, and extreme ultraviolet lithography performance MS Ober, DR Romer, J Etienne, PJ Thomas, V Jain, JF Cameron, ... Macromolecules 52 (3), 886-895, 2019 | 36 | 2019 |
| Chemically amplified positive photoresists JW Thackeray, PR Hagerty US Patent 5,879,856, 1999 | 34 | 1999 |
| Thick film photoresists and methods for use thereof JW Thackeray, JM Mori, GG Teng US Patent 6,800,422, 2004 | 32 | 2004 |
| Purification process RJ Carey, JW Thackeray US Patent 5,500,127, 1996 | 32 | 1996 |
| Investigation of onium salt type photoacid generators in positive DUV resist systems MF Cronin, TG Adams, TH Fedynyshyn, JH Georger Jr, JM Mori, RF Sinta, ... Advances in Resist Technology and Processing XI 2195, 214-224, 1994 | 31 | 1994 |
| The Development of Chemically Amplified Positive-and Negative-tone Resists for DUV Lithography JW Thackeray, T Adams, MF Cronin, M Denison, TH Fedynyshyn, ... Journal of Photopolymer Science and Technology 7 (3), 619-630, 1994 | 31 | 1994 |
Karen WooleyTexas A&M UniversityVerified email at chem.tamu.edu
