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Woongkyu Lee
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Evolution of phases and ferroelectric properties of thin Hf0.5Zr0.5O2 films according to the thickness and annealing temperature
M Hyuk Park, H Joon Kim, Y Jin Kim, W Lee, T Moon, C Seong Hwang
Applied Physics Letters 102 (24), 242905, 2013
6922013
Surface and grain boundary energy as the key enabler of ferroelectricity in nanoscale hafnia-zirconia: a comparison of model and experiment
MH Park, YH Lee, HJ Kim, T Schenk, W Lee, K Do Kim, FPG Fengler, ...
Nanoscale 9 (28), 9973-9986, 2017
2972017
Effect of forming gas annealing on the ferroelectric properties of Hf0.5Zr0.5O2 thin films with and without Pt electrodes
M Hyuk Park, H Joon Kim, Y Jin Kim, W Lee, H Kyeom Kim, ...
Applied Physics Letters 102 (11), 112914, 2013
2062013
Study on the degradation mechanism of the ferroelectric properties of thin Hf0.5Zr0.5O2 films on TiN and Ir electrodes
MH Park, HJ Kim, YJ Kim, W Lee, T Moon, KD Kim, CS Hwang
Applied Physics Letters 105 (7), 072902, 2014
1702014
Atomic Layer Deposition of SrTiO3 Thin Films with Highly Enhanced Growth Rate for Ultrahigh Density Capacitors
SW Lee, JH Han, S Han, W Lee, JH Jang, M Seo, SK Kim, C Dussarrat, ...
Chemistry of Materials 23 (8), 2227-2236, 2011
1522011
Atomic layer deposition of SrTiO3 films with cyclopentadienyl-based precursors for metal–insulator–metal capacitors
W Lee, JH Han, W Jeon, YW Yoo, SW Lee, SK Kim, CH Ko, ...
Chemistry of Materials 25 (6), 953-961, 2013
822013
Improvement in the leakage current characteristic of metal-insulator-metal capacitor by adopting RuO2 film as bottom electrode
JH Han, S Han, W Lee, SW Lee, SK Kim, J Gatineau, C Dussarrat, ...
Applied Physics Letters 99 (2), 022901, 2011
782011
Structure and electrical properties of Al-doped HfO2 and ZrO2 films grown via atomic layer deposition on Mo electrodes
YW Yoo, W Jeon, W Lee, CH An, SK Kim, CS Hwang
ACS applied materials & interfaces 6 (24), 22474-22482, 2014
732014
Influences of metal, non-metal precursors, and substrates on atomic layer deposition processes for the growth of selected functional electronic materials
SW Lee, BJ Choi, T Eom, JH Han, SK Kim, SJ Song, W Lee, CS Hwang
Coordination Chemistry Reviews 257 (23-24), 3154-3176, 2013
622013
Conformal Formation of (GeTe2)(1–x)(Sb2Te3) x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
T Eom, S Choi, BJ Choi, MH Lee, T Gwon, SH Rha, W Lee, MS Kim, ...
Chemistry of Materials 24 (11), 2099-2110, 2012
612012
Improved Initial Growth Behavior of SrO and SrTiO3 Films Grown by Atomic Layer Deposition Using {Sr (demamp)(tmhd)} 2 as Sr-Precursor
W Lee, W Jeon, CH An, MJ Chung, HJ Kim, T Eom, SM George, BK Park, ...
Chemistry of Materials 27 (11), 3881-3891, 2015
402015
Electrical properties of TiO 2-based MIM capacitors deposited by TiCl 4 and TTIP based atomic layer deposition processes
B Hudec, K Hušeková, A Tarre, JH Han, S Han, A Rosová, W Lee, ...
Microelectronic Engineering 88 (7), 1514-1516, 2011
382011
Cs2SnI6-Encapsulated Multidye-Sensitized All-Solid-State Solar Cells
B Lee, Y Ezhumalai, W Lee, MC Chen, CY Yeh, TJ Marks, RPH Chang
ACS applied materials & interfaces 11 (24), 21424-21434, 2019
352019
Growth of conductive SrRuO3 films by combining atomic layer deposited SrO and chemical vapor deposited RuO2 layers
JH Han, W Lee, W Jeon, SW Lee, CS Hwang, C Ko, J Gatineau
Chemistry of Materials 24 (24), 4686-4692, 2012
352012
The mechanism for the suppression of leakage current in high dielectric TiO2 thin films by adopting ultra-thin HfO2 films for memory application
M Seo, S Ho Rha, S Keun Kim, J Hwan Han, W Lee, S Han, ...
Journal of Applied Physics 110 (2), 024105, 2011
352011
Role of Interfacial Reaction in Atomic Layer Deposition of TiO2 Thin Films Using Ti (O-i Pr) 2 (tmhd) 2 on Ru or RuO2 Substrates
SW Lee, JH Han, SK Kim, S Han, W Lee, CS Hwang
Chemistry of Materials 23 (4), 976-983, 2011
332011
Evaluating the Top Electrode Material for Achieving an Equivalent Oxide Thickness Smaller than 0.4 nm from an Al-doped TiO2 Film
W Jeon, S Yoo, HK Kim, W Lee, CH An, MJ Chung, CJ Cho, SK Kim, ...
ACS applied materials & interfaces 6 (23), 21632-21637, 2014
322014
Controlling the Al-Doping Profile and Accompanying Electrical Properties of Rutile-Phased TiO2 Thin Films
W Jeon, SH Rha, W Lee, YW Yoo, CH An, KH Jung, SK Kim, CS Hwang
ACS applied materials & interfaces 6 (10), 7910-7917, 2014
282014
High-Resolution Colloidal Quantum Dot Film Photolithography via Atomic Layer Deposition of ZnO
GH Kim, J Lee, JY Lee, J Han, Y Choi, CJ Kang, KB Kim, W Lee, J Lim, ...
ACS Applied Materials & Interfaces 13 (36), 43075-43084, 2021
272021
Study on initial growth behavior of RuO2 film grown by pulsed chemical vapor deposition: effects of substrate and reactant feeding time
JH Han, SW Lee, SK Kim, S Han, W Lee, CS Hwang, C Dussarat, ...
Chemistry of Materials 24 (8), 1407-1414, 2012
272012
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