Jung-Hyung Kim
Jung-Hyung Kim
Verified email at kriss.re.kr
Cited by
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Plasma frequency measurements for absolute plasma density by means of wave cutoff method
JH Kim, DJ Seong, JY Lim, KH Chung
Applied physics letters 83 (23), 4725-4727, 2003
Distribution of abdominal visceral and subcutaneous adipose tissue and metabolic syndrome in a Korean population
S Kim, B Cho, H Lee, K Choi, SS Hwang, D Kim, K Kim, H Kwon
Diabetes care 34 (2), 504-506, 2011
The deposition of SiOF film with low dielectric constant in a helicon plasma source
JH Kim, SH Seo, SM Yun, HY Chang, KM Lee, CK Choi
Applied physics letters 68 (11), 1507-1509, 1996
The effects of radio-frequency bias on electron density in an inductively coupled plasma reactor
MA Sobolewski, JH Kim
Journal of Applied Physics 102, 113302, 2007
Wave cutoff method to measure absolute electron density in cold plasma
JH Kim, SC Choi, YH Shin, KH Chung
Review of scientific instruments 75 (8), 2706-2710, 2004
A study on ion energy distribution functions and plasma potentials in helicon wave plasmas
JH Kim, HY Chang
Physics of Plasmas 3 (4), 1462-1469, 1996
Frequency dependence of helicon wave plasmas near lower hybrid resonance frequency
SM Yun, JH Kim, HY Chang
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 15 (3 …, 1997
m=/spl plusmn/1 and m=/spl plusmn/2 mode helicon wave excitation
JH Kim, SM Yun, HY Chang
IEEE transactions on plasma science 24 (6), 1364-1370, 1996
Transglutaminase 2 expression predicts progression free survival in non-small cell lung cancer patients treated with epidermal growth factor receptor tyrosine kinase inhibitor
JH Jeong, BC Cho, HS Shim, HR Kim, SM Lim, SK Kim, KY Chung, ...
Journal of Korean medical science 28 (7), 1005-1014, 2013
Plasma density measurements by phase resolved cutoff
JH Kwon, SJ You, JH Kim, YH Shin
Applied Physics Letters 96, 081502, 2010
Wave transmission characteristics of a wave-cutoff probe in weakly ionized plasmas
HS Jun, BK Na, HY Chang, JH Kim
Physics of Plasmas 14 (9), 093506, 2007
Analysis of the uncertainty in the measurement of electron densities in plasmas using the wave cutoff method
JH Kim, KH Chung, YH Shin
Metrologia 42 (2), 110, 2005
Deposition and plasma measurements of Zr-oxide films with low impurity concentrations by remote PEALD
JY Kim, SH Kim, H Seo, JH Kim, H Jeon
Electrochemical and Solid State Letters 8 (3), G82, 2005
Evolution of electron temperature in inductively coupled plasma
HC Lee, BH Seo, DC Kwon, JH Kim, DJ Seong, SJ Oh, CW Chung, ...
Applied Physics Letters 110 (1), 014106, 2017
Characteristics of CFx radicals and plasma parameters in an inductively coupled CF4 plasma
JH Kim, KH Chung, YS Yoo
Journal of the Korean Physical Society 47 (2), 249, 2005
Study on self-bias voltage induced on the substrate by rf bias power in a high density plasma
JH Kim, YH Shin, KH Chung
Thin Solid Films 435 (1-2), 288-292, 2003
Characteristics of self bias voltage and poly-Si etching in pulsed helicon wave plasma
JH Kim, CJ Kang, TH Ahn, JT Moon
Thin Solid Films 345 (1), 124-129, 1999
Characterization of remote inductively coupled plasma for carbon nitride thin-film deposition
H Seo, JH Kim, KH Chung, JY Kim, SH Kim, H Jeon
Journal of applied physics 98 (4), 043308, 2005
A study on low dielectric material deposition using a helicon plasma source
JH Kim, SH Seo, SM Yun, HY Chang, KM Lee, CK Choi
Journal of the Electrochemical Society 143 (9), 2990, 1996
Effect of substrate bias on deposition behaviour of charged silicon nanoparticles in ICP-CVD process
SW Yoo, SJ You, JH Kim, DJ Seong, BH Seo, NM Hwang
Journal of Physics D: Applied Physics 50 (3), 035201, 2016
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