| Thin film deposition using microwave plasma TK Won, H Nominanda, SM Cho, SY Choi, BS Park, JM White, S Anwar, ... US Patent 8,883,269, 2014 | 426 | 2014 |
| Method and apparatus for controlling plasma uniformity J Kudela, G Furuta, CA Sorensen, SY Choi, JM White US Patent App. 12/344,210, 2009 | 383 | 2009 |
| Vertical inline CVD system S Kurita, J Kudela, S Anwar, JM White, DK Yim, HG Wolf, D Zvalo, ... US Patent 9,922,854, 2018 | 379 | 2018 |
| SiOx process chemistry development using microwave plasma CVD TK Won, SM Cho, SY Choi, BS Park, DK Yim, JM White, J Kudela US Patent 8,906,813, 2014 | 374 | 2014 |
| Guided wave applicator with non-gaseous dielectric for plasma chamber J Kudela, T Tanaka, CA Sorensen, S Anwar, JM White US Patent 9,397,380, 2016 | 193 | 2016 |
| RF bus and RF return bus for plasma chamber electrode CA Sorensen, J Kudela, RL Tiner, S Anwar, JM White US Patent 8,992,723, 2015 | 166 | 2015 |
| Characteristics of the planar plasma source sustained by microwave power I Odrobina, J Kúdela, M Kando Plasma Sources Science and Technology 7 (2), 238, 1998 | 61 | 1998 |
| Hot-electron flux observation in large-area microwave sustained plasmas J Kudela, T Terebessy, M Kando Applied Physics Letters 76 (10), 1249-1251, 2000 | 34 | 2000 |
| Asymmetrical RF drive for electrode of plasma chamber J Kudela, CA Sorensen, SY Choi, JM White US Patent 8,343,592, 2013 | 32 | 2013 |
| Detection of localized hot electrons in low-pressure large-area microwave discharges T Terebessy, M Kando, J Kudela Applied Physics Letters 77 (18), 2825-2827, 2000 | 31 | 2000 |
| Rf return path for large plasma processing chamber CA Sorensen, JM White, J Kudela, J Baek, JJ Chen, S McPherson, ... US Patent App. 12/576,991, 2010 | 24 | 2010 |
| High-speed camera study of the surface wave discharge propagation in xenon J Kudela, I Odrobina, M Kando Japanese journal of applied physics 37 (7R), 4169, 1998 | 23 | 1998 |
| Multi-electrode PECVD source J Kudela, JM White US Patent 8,438,990, 2013 | 22 | 2013 |
| Phase-Modulated RF Power for Plasma Chamber Electrode EP Hammond IV, T Tanaka, C Boitnott, J Kudela US Patent App. 13/005,526, 2011 | 19 | 2011 |
| Observation of a localized electron beam in large-area microwave discharge T Terebessy, M Širý, M Kando, J Kudela, D Korzec Applied physics letters 82 (5), 694-696, 2003 | 18 | 2003 |
| Thin film encapsulation processing system and process kit permitting low-pressure tool replacement S Kurita, J Kudela, JM White, D Haas US Patent App. 15/108,119, 2016 | 17 | 2016 |
| Electrode and power coupling scheme for uniform process in a large-area pecvd chamber J Kudela, TT Tanaka US Patent App. 12/493,721, 2010 | 16 | 2010 |
| RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus J Kudela, CA Sorensen, JM White US Patent 8,728,586, 2014 | 14 | 2014 |
| Atomic layer deposition processing chamber permitting low-pressure tool replacement S Kurita, J Kudela, JM White, D Haas US Patent 10,184,179, 2019 | 13 | 2019 |
| Gas delivery and distribution for uniform process in linear-type large-area plasma reactor JM White, S Anwar, J Kudela, CA Sorensen, TK Won, SM Cho, SY Choi, ... US Patent App. 13/538,389, 2013 | 13 | 2013 |
