| Pulsed plasma polymerization of maleic anhydride ME Ryan, AM Hynes, JPS Badyal Chemistry of materials 8 (1), 37-42, 1996 | 257 | 1996 |
| Recent advances in silicon etching for MEMS using the ASE™ process AM Hynes, H Ashraf, JK Bhardwaj, J Hopkins, I Johnston, JN Shepherd Sensors and Actuators A: Physical 74 (1-3), 13-17, 1999 | 253 | 1999 |
| Method of surface treatment of semiconductor substrates JK Bhardwaj, H Ashraf, B Khamsehpour, J Hopkins, AM Hynes, ME Ryan, ... US Patent 6,051,503, 2000 | 240 | 2000 |
| Method and apparatus for etching a substrate J Hopkins, IR Johnston, JK Bhardwaj, H Ashraf, AM Hynes, LM Lea US Patent 6,187,685, 2001 | 155 | 2001 |
| Pulsed plasma polymerization of perfluorocyclohexane AM Hynes, MJ Shenton, JPS Badyal Macromolecules 29 (12), 4220-4225, 1996 | 94 | 1996 |
| A methodology for curve‐fitting of the XPS Si 2p core level from thin siloxane coatings LA O'Hare, A Hynes, MR Alexander Surface and Interface Analysis: An International Journal devoted to the …, 2007 | 89 | 2007 |
| Gallium and indium compounds of sulphur donor ligands: Pyridine-2-thiolates and diphenylthiophosphinates CC Landry, A Hynes, AR Barron, I Haiduc, C Silvestru Polyhedron 15 (3), 391-402, 1996 | 60 | 1996 |
| Method of surface treatment of semiconductor substrates JK Bhardwaj, H Ashraf, B Khamsehpour, J Hopkins, AM Hynes, ME Ryan, ... US Patent 6,261,962, 2001 | 59 | 2001 |
| Effect of plasma exposure on the chemistry and morphology of aerosol‐assisted, plasma‐deposited coatings B Twomey, M Rahman, G Byrne, A Hynes, LA O'Hare, L O'Neill, ... Plasma processes and polymers 5 (8), 737-744, 2008 | 56 | 2008 |
| The benefits of process parameter ramping during the plasma etching of high aspect ratio silicon structures J Hopkins, H Ashraf, JK Bhardwaj, AM Hynes, I Johnston, JN Shepherd MRS Online Proceedings Library (OPL) 546, 63, 1998 | 46 | 1998 |
| Atmospheric pressure plasma treatment of amorphous polyethylene terephthalate for enhanced heatsealing properties DP Dowling, J Tynan, P Ward, AM Hynes, J Cullen, G Byrne International Journal of Adhesion and Adhesives 35, 1-8, 2012 | 44 | 2012 |
| Selective incorporation of perfluorinated phenyl rings during pulsed plasma polymerization of perfluoroallylbenzene A Hynes, JPS Badyal Chemistry of materials 10 (8), 2177-2182, 1998 | 34 | 1998 |
| Comparison of pilot and industrial scale atmospheric pressure glow discharge systems including a novel electro-acoustic technique for process monitoring J Tynan, VJ Law, P Ward, AM Hynes, J Cullen, G Byrne, S Daniels, ... Plasma Sources Science and Technology 19 (1), 015015, 2009 | 32 | 2009 |
| Plasma polymerization of 2-iodothiophene ME Ryan, AM Hynes, SH Wheale, JPS Badyal, C Hardacre, RM Ormerod Chemistry of materials 8 (4), 916-921, 1996 | 32 | 1996 |
| Plasma polymerization of trifluoromethyl-substituted perfluorocyclohexane monomers AM Hynes, MJ Shenton, JPS Badyal Macromolecules 29 (1), 18-21, 1996 | 25 | 1996 |
| Rapid discharge sintering of nickel–diamond metal matrix composites B Twomey, A Breen, G Byrne, A Hynes, DP Dowling Journal of Materials Processing Technology 211 (7), 1210-1216, 2011 | 22 | 2011 |
| Defining conditions for the etching of silicon in an inductive coupled plasma reactor H Ashraf, JK Bhardwaj, E Guibarra, S Hall, J Hopkins, AM Hynes, ... MRS Online Proceedings Library (OPL) 605, 299, 1999 | 14 | 1999 |
| Advances in high rate silicon and oxide etching using ICP J Bhardwaj, H Ashraf, J Hopkins, I Johnston, S McAuley, S Hall, ... MEMS/MST technology symposium at SEMICON West 99, 1999 | 13 | 1999 |
| Evaluation of the mechanical behaviour of nanometre-thick coatings deposited using an atmospheric pressure plasma system B Twomey, G Byrne, A Hynes, L O'Neill, D Dowling Surface and Coatings Technology 203 (14), 2021-2029, 2009 | 12 | 2009 |
| Fluid Replacement System J Kennedy, R Sibbick, F Swallow, P Dobbyn, A Hynes, J Brennan US Patent App. 12/299,133, 2009 | 11 | 2009 |
