| A Comparative Study of Cr2O3 Thin Films Obtained by MOCVD using Three Different Precursors G Carta, M Natali, G Rossetto, P Zanella, G Salmaso, S Restello, V Rigato, ... Chemical Vapor Deposition 11 (8‐9), 375-380, 2005 | 55 | 2005 |
| Chemical, morphological and nano-mechanical characterizations of Al2O3 thin films deposited by metal organic chemical vapour deposition on AISI 304 stainless steel M Natali, G Carta, V Rigato, G Rossetto, G Salmaso, P Zanella Electrochimica Acta 50 (23), 4615-4620, 2005 | 45 | 2005 |
| Electrochemical anticorrosion performance evaluation of Al2O3 coatings deposited by MOCVD on an industrial brass substrate F Guidi, G Moretti, G Carta, M Natali, G Rossetto, Z Pierino, G Salmaso, ... Electrochimica acta 50 (23), 4609-4614, 2005 | 34 | 2005 |
| Structure and interface properties of Mo/B4C/Si multilayers deposited by rf-magnetron sputtering A Patelli, J Ravagnan, V Rigato, G Salmaso, D Silvestrini, E Bontempi, ... Applied surface science 238 (1-4), 262-268, 2004 | 29 | 2004 |
| 0.33 NA EUV systems for high volume manufacturing C Smeets, N Benders, F Bornebroek, J Carbone, R van Es, A Minnaert, ... Optical and EUV Nanolithography XXXVI 12494, 34-42, 2023 | 27 | 2023 |
| ASML NXE pellicle update D Brouns, P Broman, JW van der Horst, R Lafarre, R Maas, T Modderman, ... Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation …, 2019 | 24 | 2019 |
| Effects of ion bombardment and gas incorporation on the properties of Mo/a-Si: H multilayers for EUV applications V Rigato, A Patelli, G Maggioni, G Salmaso, V Mattarello, MG Pelizzo, ... Surface and Coatings Technology 174, 40-48, 2003 | 24 | 2003 |
| Ion bombardment effects on nucleation of sputtered Mo nano-crystals in Mo/B4C/Si multilayers A Patelli, V Rigato, G Salmaso, NJM Carvalho, JTM De Hosson, ... Surface and Coatings Technology 201 (1-2), 143-147, 2006 | 22 | 2006 |
| A new generation EUV pellicle to enable future EUV lithographic nodes at enhanced productivity G Salmaso, R Maas International Conference on Extreme Ultraviolet Lithography 2021 11854, 118540R, 2021 | 12 | 2021 |
| High-transmission EUV pellicles supporting> 400W source power M van de Kerkhof, A Klein, P Vermeulen, T van der Woord, I Donmez, ... Optical and EUV Nanolithography XXXV 12051, 70-77, 2022 | 11 | 2022 |
| Development of multilayer coatings for solar space experiments MG Pelizzo, A Patelli, P Nicolosi, V Rigato, G Salmaso, E Bontempi, ... Innovative Telescopes and Instrumentation for Solar Astrophysics 4853, 381-392, 2003 | 11 | 2003 |
| Characterization of thermally treated Mo/Si multilayer mirrors with standing wave-assisted EXAFS M Rovezzi, F d’Acapito, A Patelli, V Rigato, G Salmaso, E Bontempi, ... Nuclear Instruments and Methods in Physics Research Section B: Beam …, 2006 | 8 | 2006 |
| Technologies for manufacturing of high angular resolution multilayer coated optics for future New Hard X-ray Missions: a status report G Borghi, D Vernani, EM Boscolo, O Citterio, G Grisoni, J Kools, F Marioni, ... Optics for EUV, X-Ray, and Gamma-Ray Astronomy IV 7437, 307-316, 2009 | 6 | 2009 |
| Enabling deposition of hard x-ray reflective coatings as an industrial manufacturing process D Garoli, EB Marchi, V Mattarello, J Bertoli, G Salmaso, J Kools, D Spiga, ... EUV and X-Ray Optics: Synergy between Laboratory and Space 7360, 252-259, 2009 | 6 | 2009 |
| Design and fabrication considerations of EUVL collectors for HVM G Bianucci, GL Cassol, J Kools, M Prea, G Salmaso, G Valsecchi, ... Alternative Lithographic Technologies 7271, 101-109, 2009 | 6 | 2009 |
| Grazing-incidence reflectivity of Si-Au coatings for optics with high thermal load L Poletto, G Naletto, G Tondello, A Patelli, V Rigato, G Salmaso, ... Telescopes and Instrumentation for Solar Astrophysics 5171, 344-353, 2004 | 5 | 2004 |
| Grazing-incidence reflectivity of Si-Au coatings for optics with high thermal load L Poletto, G Naletto, G Tondello, A Patelli, V Rigato, G Salmaso, ... Telescopes and Instrumentation for Solar Astrophysics 5171, 344-353, 2004 | 5 | 2004 |
| Pellicle for euv lithography D De Graaf, R Beaudry, M Biron, P Janssen, T Kater, K Kornelsen, ... US Patent App. 17/048,875, 2021 | 1 | 2021 |
| Apparatus and method for processing a reticle and pellicle assembly VY Banine, PA Vermeulen, CA De Meijere, JHJ Moors, A Nikipelov, ... US Patent App. 18/022,476, 2023 | | 2023 |
| X-ray tests at PANTER on the TDM1 optic prototype for the New Hard X-ray Mission D SPIGA, L Raimondi, G Valsecchi, A Orlandi, G Borghi, G Salmaso, ... OA Brera, 2010 | | 2010 |
