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Eiji Kusano
Eiji Kusano
Verified email at neptune.kanazawa-it.ac.jp
Title
Cited by
Cited by
Year
Electrical and mechanical properties of SnO2: Nb films for touch screens
N Kikuchi, E Kusano, E Kishio, A Kinbara
Vacuum 66 (3-4), 365-371, 2002
912002
Effects of microstructure and nonstoichiometry on electrical properties of vanadium dioxide films
E Kusano, JA Theil
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 7 (3 …, 1989
841989
Thermal stability of heat‐reflective films consisting of oxide–Ag–oxide deposited by dc magnetron sputtering
E Kusano, J Kawaguchi, K Enjouji
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 4 (6 …, 1986
821986
Deposition of vanadium oxide films by direct‐current magnetron reactive sputtering
E Kusano, JA Theil, JA Thornton
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 6 (3 …, 1988
801988
Elastic and plastic energies in sputtered multilayered Ti–TiN films estimated by nanoindentation
N Kikuchi, M Kitagawa, A Sato, E Kusano, H Nanto, A Kinbara
Surface and Coatings Technology 126 (2-3), 131-135, 2000
542000
A smart gas sensor using polymer-film-coated quartz resonator microbalance
H Nanto, N Dougami, T Mukai, M Habara, E Kusano, A Kinbara, T Ogawa, ...
Sensors and Actuators B: Chemical 66 (1-3), 16-18, 2000
532000
An investigation of hysteresis effects as a function of pumping speed, sputtering current, and O2/Ar ratio, in Ti‐O2 reactive sputtering processes
E Kusano
Journal of applied physics 70 (11), 7089-7096, 1991
521991
Structure-zone modeling of sputter-deposited thin films: a brief review
E Kusano
Applied Science and Convergence Technology 28 (6), 179-185, 2019
492019
Evaluation of adhesion strength of Ti films on Si (100) by the internal stress method
A Kinbara, E Kusano, T Kamiya, I Kondo, O Takenaka
Thin Solid Films 317 (1-2), 165-168, 1998
491998
TiOx film formation process by reactive sputtering
A Kinbara, E Kusano, S Baba
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 10 (4 …, 1992
481992
Titanium carbide film deposition by DC magnetron reactive sputtering using a solid carbon source
E Kusano, A Satoh, M Kitagawa, H Nanto, A Kinbara
Thin Solid Films 343, 254-256, 1999
471999
Phonon scattering in electron transport phenomena of ITO films
N Kikuchi, E Kusano, H Nanto, A Kinbara, H Hosono
Vacuum 59 (2-3), 492-499, 2000
462000
Preparation of TiC films by alternate deposition of Ti and C layers using a dual magnetron sputtering source
E Kusano, A Sato, N Kikuchi, H Nanto, A Kinbara
Surface and Coatings Technology 120, 378-382, 1999
441999
Hardness enhancement by compositionally modulated structure of Ti/TiN multilayer films
E Kusano, M Kitagawa, H Nanto, A Kinbara
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 16 (3 …, 1998
411998
Vanadium reactive magnetron sputtering in mixed Ar/O2 discharges
JA Theil, E Kusano, A Rockett
Thin Solid Films 298 (1-2), 122-129, 1997
401997
Adhesion and hardness of compositionally gradient TiO2/Ti/TiN, ZrO2/Zr/ZrN, and TiO2/Ti/Zr/ZrN coatings
E Kusano, M Kitagawa, Y Kuroda, H Nanto, A Kinbara
Thin Solid Films 334 (1-2), 151-155, 1998
381998
Effects of radio-frequency plasma on structure and properties in Ti film deposition by dc and pulsed dc magnetron sputtering
T Oya, E Kusano
Thin Solid Films 517 (20), 5837-5843, 2009
352009
Mechanisms of carrier generation and transport in Ni-doped Cu2O
N Kikuchi, K Tonooka, E Kusano
Vacuum 80 (7), 756-760, 2006
332006
Imidized organic thin films deposited on glass substrates
K Fukushima, Y Ikeda, T Hayashi, N Kikuchi, E Kusano, A Kinbara
Thin solid films 392 (2), 254-257, 2001
332001
Characterization of organic polymer thin films deposited by rf magnetron sputtering
T Oya, E Kusano
Vacuum 83 (3), 564-568, 2008
322008
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