| Fundamental principles of optical lithography: the science of microfabrication C Mack John Wiley & Sons, 2007 | 1160 | 2007 |
| Fifty years of Moore's law CA Mack IEEE Transactions on semiconductor manufacturing 24 (2), 202-207, 2011 | 961 | 2011 |
| Development of positive photoresists CA Mack Journal of the Electrochemical Society 134 (1), 148, 1987 | 270 | 1987 |
| PROLITH: a comprehensive optical lithography model CA Mack Optical Microlithography IV 538, 207-220, 1985 | 265 | 1985 |
| Field guide to optical lithography CA Mack SPIE, 2006 | 179 | 2006 |
| Overlay metrology and control method M Adel, M Ghinovker, E Kassel, B Golovanevsky, JC Robinson, CA Mack, ... US Patent 7,804,994, 2010 | 168 | 2010 |
| Method for determining lithographic focus and exposure W MIEHER, T DZIURA, A LEVY, C MACK, KLAT CORPORATION WO Patent 2,003,001,297, 2003 | 161* | 2003 |
| Inside PROLITH (TM): A Comprehensive Guide to Optical Lithography Simulation for the PROLITH Family of Lithography Simulation Tools, V5. 0 CA Mack Finle Technologies, 1997 | 145* | 1997 |
| Phase Phirst! An improved strong-PSM paradigm D Levenson, JS Petersen, DJ Gerold, CA Mack 20th Annual BACUS Symposium on Photomask Technology 4186, 395-404, 2001 | 103 | 2001 |
| Generating random rough edges, surfaces, and volumes CA Mack Applied Optics 52 (7), 1472-1480, 2013 | 102 | 2013 |
| Analytical expression for the standing wave intensity in photoresist CA Mack Applied optics 25 (12), 1958-1961, 1986 | 100 | 1986 |
| How to write a good scientific paper CA Mack (No Title), 2018 | 91 | 2018 |
| Design and analysis of manufacturable alternating phase-shifting masks RL Gordon, CA Mack, JS Petersen 18th Annual BACUS Symposium on Photomask Technology and Management 3546, 606-616, 1998 | 88 | 1998 |
| Need for LWR metrology standardization: the imec roughness protocol GF Lorusso, T Sutani, V Rutigliani, F Van Roey, A Moussa, AL Charley, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 17 (4), 041009-041009, 2018 | 84 | 2018 |
| Method for process optimization and control by comparison between 2 or more measured scatterometry signals WD Mieher, CA Mack, M Hankinson US Patent 7,352,453, 2008 | 84 | 2008 |
| Reducing roughness in extreme ultraviolet lithography CA Mack Journal of Micro/Nanolithography, MEMS, and MOEMS 17 (4), 041006-041006, 2018 | 83 | 2018 |
| Absorption and exposure in positive photoresist CA Mack Applied Optics 27 (23), 4913-4919, 1988 | 83 | 1988 |
| The impact of attenuated phase shift mask topography on hyper-NA lithography CA Mack, MD Smith, T Graves 25th Annual BACUS Symposium on Photomask Technology 5992, 306-316, 2005 | 78 | 2005 |
| The lithography expert-Optical behavior of pellicles CA Mack Microlithography World 16 (4), 10-+, 2007 | 75 | 2007 |
| Understanding focus effects in submicron optical lithography CA Mack 1988 Microlithography Conferences, 135-148, 1988 | 72 | 1988 |
