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Johannes Seiffe
Johannes Seiffe
Verified email at ise.fraunhofer.de
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Surface passivation of crystalline silicon by plasma-enhanced chemical vapor deposition double layers of silicon-rich silicon oxynitride and silicon nitride
J Seiffe, L Gautero, M Hofmann, J Rentsch, R Preu, S Weber, RA Eichel
Journal of Applied Physics 109 (3), 2011
1032011
Towards industrial n-type PERT silicon solar cells: rear passivation and metallization scheme
A Richter, J Benick, A Kalio, J Seiffe, M Hörteis, M Hermle, SW Glunz
Energy Procedia 8, 479-486, 2011
492011
Honeycomb structure on multi-crystalline silicon Al-BSF solar cell with 17.8% efficiency
AK Volk, N Tucher, J Seiffe, H Hauser, M Zimmer, B Bläsi, M Hofmann, ...
IEEE Journal of Photovoltaics 5 (4), 1027-1033, 2015
342015
Alternative rear surface passivation for industrial cell production
J Seiffe, L Weiss, M Hofmann, L Gautero, J Rentsch
Proceedings of the 23rd European Photovoltaic Solar Energy Conference, 1700-1703, 2008
302008
All-screen-printed 120-µm-thin large-area silicon solar cells applying dielectric rear passivation and laser-fired contacts reaching 18% efficiency
L Gautero, M Hofmann, J Rentsch, A Lemke, S Mack, J Seiffe, J Nekarda, ...
2009 34th IEEE Photovoltaic Specialists Conference (PVSC), 001888-001893, 2009
292009
Nanostructuring of c‐Si surface by F2‐based atmospheric pressure dry texturing process
B Kafle, J Seiffe, M Hofmann, L Clochard, E Duffy, J Rentsch
physica status solidi (a) 212 (2), 307-311, 2015
222015
Impact of texture roughness on the front-side metallization of stencil-printed silicon solar cells
A Lorenz, T Strauch, M Demant, T Fellmeth, TB Hofmeister, M Linse, ...
IEEE Journal of Photovoltaics 5 (4), 1237-1244, 2015
152015
Effects of high‐temperature treatment on the hydrogen distribution in silicon oxynitride/silicon nitride stacks for crystalline silicon surface passivation
C Schwab, M Hofmann, R Heller, J Seiffe, J Rentsch, R Preu
physica status solidi (a) 210 (11), 2399-2403, 2013
122013
Charge carrier trapping at passivated silicon surfaces
J Seiffe, M Hofmann, J Rentsch, R Preu
Journal of Applied Physics 109 (6), 2011
122011
Increased ion energies for texturing in a high-throughput plasma tool
P Piechulla, J Seiffe, M Hofmann, J Rentsch, R Preu
Proceedings at the 26th European photovoltaic energy conference, 2011
122011
Multifunctional PECVD layers: dopant source, passivation, and optics
J Seiffe, F Pillath, D Trogus, AA Brand, C Savio, M Hofmann, J Rentsch
IEEE Journal of Photovoltaics 3 (1), 224-229, 2012
112012
Comparison of different rear contacting approaches for industrial PERC solar cells on mc-si wafer
L Gautero, D Kania, J Seiffe, A Knorz, J Specht, J Nekarda, M Hofmann, ...
Proc. 25th EU PVSEC/5th WCPEC, 1328-1331, 2010
112010
Plasma-based surface modification technologies for crystalline silicon photovoltaics
JS Seiffe
Dissertation, Albert-Ludwigs-Universität Freiburg, 2013, 2013
92013
Overview on crystalline silicon solar cells using PECVD rear passivation and laser-fired contacts
M Hofmann, P Saint-Cast, D Suwito, J Seiffe, C Schmidt, S Kambor, ...
Proceedings of the 24th European Photovoltaic Solar Energy Conference, 21-25, 2009
92009
PECVD Al2O3/a‐Si:B as a dopant source and surface passivation
J Seiffe, A Gahoi, M Hofmann, J Rentsch, R Preu
physica status solidi (a) 210 (8), 1593-1599, 2013
72013
Plasma deposition of amorphous silicon dopant sources
J Jeurink, J Seiffe, M Hofmann, J Rentsch, R Preu
Proceedings of the 26th European PV Solar Energy Conference and Exhibition, 5-9, 2011
62011
Proceedings of the 24th European Photovoltaic Solar Energy Conference
M Hofmann, P Saint-Cast, D Suwito, J Seiffe, C Schmidt, S Kambor, ...
62009
Method for producing a selective doping structure in a semiconductor substrate in order to produce a photovoltaic solar cell
U Jager, D Biro, AK Volk, J Seiffe, S Mack, A Wolf, R Preu
US Patent 8,927,317, 2015
32015
Method for producing a selective doping structure in a semiconductor substrate in order to produce a photovoltaic solar cell
U Jager, D Biro, AK Volk, J Seiffe, S Mack, A Wolf, R Preu
US Patent 8,927,317, 2015
32015
Phosphoric anti-reflective coatings as dopant source and front-side passivation for industrial silicon solar cell manufacturing
D Trogus, J Seiffe, F Pillath, M Hofmann, A Wolf, J Rentsch
Proc. 26th EU PVSEC, Hamburg, Germany, 1361-1364, 2011
32011
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