| Nondestructive, high-resolution, chemically specific 3D nanostructure characterization using phase-sensitive EUV imaging reflectometry M Tanksalvala, CL Porter, Y Esashi, B Wang, NW Jenkins, Z Zhang, ... Science Advances 7 (5), eabd9667, 2021 | 68 | 2021 |
| Coherent Fourier scatterometry using orbital angular momentum beams for defect detection B Wang, M Tanksalvala, Z Zhang, Y Esashi, NW Jenkins, MM Murnane, ... Optics Express 29 (3), 3342-3358, 2021 | 30 | 2021 |
| Ptychographic amplitude and phase reconstruction of bichromatic vortex beams Y Esashi, CT Liao, B Wang, N Brooks, KM Dorney, C Hernández-García, ... Optics Express 26 (26), 34007-34015, 2018 | 25 | 2018 |
| High-fidelity ptychographic imaging of highly periodic structures enabled by vortex high harmonic beams B Wang, NJ Brooks, P Johnsen, NW Jenkins, Y Esashi, I Binnie, ... Optica 10 (9), 1245-1252, 2023 | 18 | 2023 |
| Temporal and spectral multiplexing for EUV multibeam ptychography with a high harmonic light source NJ Brooks, B Wang, I Binnie, M Tanksalvala, Y Esashi, JL Knobloch, ... Optics Express 30 (17), 30331-30346, 2022 | 17 | 2022 |
| Influence of surface and interface roughness on X-ray and extreme ultraviolet reflectance: A comparative numerical study Y Esashi, M Tanksalvala, Z Zhang, NW Jenkins, HC Kapteyn, ... OSA Continuum 4 (5), 1497-1518, 2021 | 13 | 2021 |
| Robust and reliable actinic ptychographic imaging of highly periodic structures in EUV photomasks B Wang, N Brooks, M Tanksalvala, Y Esashi, N Jenkins, P Johnsen, ... Photomask Technology 2022 12293, 101-109, 2022 | 6 | 2022 |
| Universal Behavior of Highly Confined Heat Flow in Semiconductor Nanosystems: From Nanomeshes to Metalattices B McBennett, A Beardo, EE Nelson, B Abad, TD Frazer, A Adak, Y Esashi, ... Nano Letters 23 (6), 2129-2136, 2023 | 5 | 2023 |
| Highfidelity ptychographic imaging of highly periodic structures enabled by vortex high harmonic beams. arXiv 2023 B Wang, NJ Brooks, PC Johnsen, NW Jenkins, Y Esashi, I Binnie, ... arXiv preprint arXiv:2301.05563, 0 | 5 | |
| Tabletop extreme ultraviolet reflectometer for quantitative nanoscale reflectometry, scatterometry, and imaging Y Esashi, NW Jenkins, Y Shao, JM Shaw, S Park, MM Murnane, ... Review of Scientific Instruments 94 (12), 2023 | 4 | 2023 |
| High-resolution, wavefront-sensing, full-field polarimetry of arbitrary beams using phase retrieval MN Jacobs, Y Esashi, NW Jenkins, NJ Brooks, HC Kapteyn, MM Murnane, ... Optics Express 30 (15), 27967-27982, 2022 | 2 | 2022 |
| A new metrology technique for defect inspection via coherent Fourier scatterometry using orbital angular momentum beams B Wang, M Tanksalvala, Z Zhang, Y Esashi, NW Jenkins, M Murnane, ... Laser Science, JTh5A. 127, 2021 | 2 | 2021 |
| EUV scatterometry: low-dose characterization of polymer-based metamaterials NW Jenkins, Y Esashi, Y Shao, M Tanksalvala, HC Kapteyn, MM Murnane, ... Metrology, Inspection, and Process Control XXXVIII 12955, 250-252, 2024 | | 2024 |
| Nondestructive, high-resolution, chemically specific 3D nanostructure characterization using extreme ultraviolet, coherent diffractive imaging reflectometry M Tanksalvala, Y Esashi, CL Porter, NW Jenkins, B Wang, Z Zhang, ... Laser Science, LM1F. 4, 2023 | | 2023 |
| Vortex High Harmonic Beams Enable High-Fidelity Ptychographic Imaging of Highly Periodic Structures I Binnie, B Wang, NJ Brooks, P Johnsen, Y Esashi, N Jenkins, G Gui, ... Computational Optical Sensing and Imaging, CM4B. 3, 2023 | | 2023 |
| High-fidelity actinic ptychographic imaging of EUV photomasks enabled by illumination engineering B Wang, NJ Brooks, I Binnie, M Tanksalvala, Y Esashi, NW Jenkins, ... Metrology, Inspection, and Process Control XXXVII 12496, 124960A, 2023 | | 2023 |
| Multi-modal tabletop EUV reflectometry for characterization of nanostructures Y Esashi, NW Jenkins, M Tanksalvala, Y Shao, B McBennett, JL Knobloch, ... Metrology, Inspection, and Process Control XXXVII 12496, 308-309, 2023 | | 2023 |
| Universal heat flow behavior in highly-confined semiconductor nanosystems B McBennett, A Beardo, E Nelson, C Bevis, S Yazdi, B Abad, T Frazer, ... APS March Meeting Abstracts 2023, T40. 008, 2023 | | 2023 |
| Towards shot-noise-limited EUV reflectometry: in a tabletop coherent EUV microscope N Jenkins, M Tanksalvala, Y Esashi, HC Kapteyn, MM Murnane Metrology, Inspection, and Process Control XXXVI, PC1205306, 2022 | | 2022 |
| Temporal and Spectral Multiplexing for High-harmonic Multibeam Ptychography in the Extreme Ultraviolet NJ Brooks, B Wang, C Bevis, I Binnie, M Tanksalvala, Y Esashi, ... 2022 Conference on Lasers and Electro-Optics (CLEO), 1-2, 2022 | | 2022 |
