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Han Joon Kim
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Ferroelectricity and Antiferroelectricity of Doped Thin HfO2‐Based Films
MH Park, YH Lee, HJ Kim, YJ Kim, T Moon, KD Kim, J Mueller, A Kersch, ...
Advanced Materials 27 (11), 1811-1831, 2015
9732015
Evolution of phases and ferroelectric properties of thin Hf0. 5Zr0. 5O2 films according to the thickness and annealing temperature
M Hyuk Park, H Joon Kim, Y Jin Kim, W Lee, T Moon, C Seong Hwang
Applied Physics Letters 102 (24), 2013
6922013
The effects of crystallographic orientation and strain of thin Hf0. 5Zr0. 5O2 film on its ferroelectricity
M Hyuk Park, H Joon Kim, Y Jin Kim, T Moon, C Seong Hwang
Applied Physics Letters 104 (7), 2014
3922014
Thin HfxZr1‐xO2 Films: A New Lead‐Free System for Electrostatic Supercapacitors with Large Energy Storage Density and Robust Thermal Stability
MH Park, HJ Kim, YJ Kim, T Moon, KD Kim, CS Hwang
Advanced Energy Materials 4 (16), 1400610, 2014
3282014
Surface and grain boundary energy as the key enabler of ferroelectricity in nanoscale hafnia-zirconia: A comparison of model and experiment
MH Park, YH Lee, HJ Kim, T Schenk, W Lee, K Do Kim, FPG Fengler, ...
Nanoscale 9 (28), 9973-9986, 2017
2972017
A study on the wake-up effect of ferroelectric Hf 0.5 Zr 0.5 O 2 films by pulse-switching measurement
HJ Kim, MH Park, YJ Kim, YH Lee, T Moon, K Do Kim, SD Hyun, ...
Nanoscale 8 (3), 1383-1389, 2016
2352016
Grain size engineering for ferroelectric Hf0. 5Zr0. 5O2 films by an insertion of Al2O3 interlayer
HJ Kim, MH Park, YJ Kim, YH Lee, W Jeon, T Gwon, T Moon, KD Kim, ...
Applied Physics Letters 105 (19), 2014
2352014
Ferroelectricity in undoped-HfO 2 thin films induced by deposition temperature control during atomic layer deposition
KD Kim, MH Park, HJ Kim, YJ Kim, T Moon, YH Lee, SD Hyun, T Gwon, ...
Journal of Materials Chemistry C 4 (28), 6864-6872, 2016
2092016
Effect of forming gas annealing on the ferroelectric properties of Hf0. 5Zr0. 5O2 thin films with and without Pt electrodes
M Hyuk Park, H Joon Kim, Y Jin Kim, W Lee, H Kyeom Kim, ...
Applied Physics Letters 102 (11), 2013
2062013
Toward a multifunctional monolithic device based on pyroelectricity and the electrocaloric effect of thin antiferroelectric HfxZr1− xO2 films
MH Park, HJ Kim, YJ Kim, T Moon, K Do Kim, CS Hwang
Nano Energy 12, 131-140, 2015
2042015
Effect of Zr Content on the Wake-Up Effect in Hf1–xZrxO2 Films
MH Park, HJ Kim, YJ Kim, YH Lee, T Moon, KD Kim, SD Hyun, F Fengler, ...
ACS applied materials & interfaces 8 (24), 15466-15475, 2016
1932016
Understanding the formation of the metastable ferroelectric phase in hafnia–zirconia solid solution thin films
MH Park, YH Lee, HJ Kim, YJ Kim, T Moon, K Do Kim, SD Hyun, ...
Nanoscale 10 (2), 716-725, 2018
1922018
Study on the degradation mechanism of the ferroelectric properties of thin Hf0. 5Zr0. 5O2 films on TiN and Ir electrodes
MH Park, HJ Kim, YJ Kim, W Lee, T Moon, KD Kim, CS Hwang
Applied Physics Letters 105 (7), 2014
1702014
Study on the size effect in Hf0. 5Zr0. 5O2 films thinner than 8 nm before and after wake-up field cycling
MH Park, HJ Kim, YJ Kim, YH Lee, T Moon, KD Kim, SD Hyun, CS Hwang
Applied Physics Letters 107 (19), 2015
1542015
Ferroelectric properties and switching endurance of Hf0.5Zr0.5O2 films on TiN bottom and TiN or RuO2 top electrodes
MH Park, HJ Kim, YJ Kim, W Jeon, T Moon, CS Hwang
physica status solidi (RRL)–Rapid Research Letters 8 (6), 532-535, 2014
1472014
Giant Negative Electrocaloric Effects of Hf0.5 Zr0.5 O2 Thin Films.
MH Park, HJ Kim, YJ Kim, T Moon, KD Kim, YH Lee, SD Hyun, CS Hwang
Advanced Materials (Deerfield Beach, Fla.) 28 (36), 7956-7961, 2016
1272016
Scale-up and optimization of HfO2-ZrO2 solid solution thin films for the electrostatic supercapacitors
K Do Kim, YH Lee, T Gwon, YJ Kim, HJ Kim, T Moon, SD Hyun, HW Park, ...
Nano Energy 39, 390-399, 2017
1042017
Study on the internal field and conduction mechanism of atomic layer deposited ferroelectric Hf 0.5 Zr 0.5 O 2 thin films
MH Park, HJ Kim, YJ Kim, T Moon, KD Kim, YH Lee, SD Hyun, CS Hwang
Journal of Materials Chemistry C 3 (24), 6291-6300, 2015
1002015
Preparation and characterization of ferroelectric Hf0. 5Zr0. 5O2 thin films grown by reactive sputtering
YH Lee, HJ Kim, T Moon, K Do Kim, SD Hyun, HW Park, YB Lee, MH Park, ...
Nanotechnology 28 (30), 305703, 2017
942017
Time-Dependent Negative Capacitance Effects in Al2O3/BaTiO3 Bilayers
YJ Kim, H Yamada, T Moon, YJ Kwon, CH An, HJ Kim, KD Kim, YH Lee, ...
Nano letters 16 (7), 4375-4381, 2016
902016
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